Method and apparatus for improved plasma processing uniformity,申请号AU20010079189-传众专利搜索

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发明名称	Method and apparatus for improved plasma processing uniformity
摘要
申请公布号	AU7918901(A)	申请公布日期	2002.02.18
申请号	AU20010079189	申请日期	2001.08.06
申请人	TOKYO ELECTRON LIMITED	发明人	ANDREJ S. MITROVIC;ERIC J. STRANG;MURRAY D. SIRKIS;BILL H. QUON;RICHARD PARSONS;YUJI TSUKAMOTO
分类号	H01J37/32	主分类号	H01J37/32
代理机构		代理人
主权项
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