| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate-processing method and a substrate processor, which can safely perform a processing, with out producing watermarks or dissolution of resist. SOLUTION: A wafer W is immersed in pure water in a processing tank 61, and is rinsed and cleaned. Dichloromethane is supplied into the processing tank 61. A state, in which the wafer is immersed in pure water, is converted to a state where it is immersed in dichloromethane. Then, the wafer W is raised to a drying chamber 61, dichloromethane adhered to the surface of the water W is evaporated and hot N2 gas is discharged to the water W.
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