发明名称 CHARACTERISTIC MEASURING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a characteristic measuring apparatus by which the light intensity of a laser beam from a semiconductor laser unit and the distribution of the light intensity can be measured. SOLUTION: The characteristic measuring apparatus measures the characteristic of the laser beam 14 from the semiconductor laser unit 7 which is provided with a semiconductor laser 9, a lens 10 which converges a laser beam from the semiconductor laser 9 and an aperture 12 which shapes a laser beam from the lens 10. The apparatus is provided with a first light receiving element 1 which measures the light intensity of the laser beam from the unit 7 and a second light receiving element 2 which measures the distribution of the light intensity of the laser beam 14. The first and second elements 1, 2 are constituted so as to comprise a light receiving area which is larger than the area of the opening 12a of the aperture 12.
申请公布号 JP2002048639(A) 申请公布日期 2002.02.15
申请号 JP20000232119 申请日期 2000.07.31
申请人 RICOH CO LTD 发明人 SHIMIZU KENICHI
分类号 G01J1/02;H01S5/00;(IPC1-7):G01J1/02 主分类号 G01J1/02
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