发明名称 STAGE DEVICE, MEASURING APPARATUS AND METHOD, ALIGNER AND EXPOSURE METHOD
摘要 PROBLEM TO BE SOLVED: To provide a stage device, capable of being used suitably for a TIS measurement of an alignment microscope. SOLUTION: A substrate holder (25) is mounted on a stage (WST) moving in a two-dimensional surface, and the holder holds a substrate (W) by a driver and can rotate at substantially 180 deg. about a prescribed rotating axis perpendicular to the two-dimensional surface. Accordingly, in the case of for example, the TIS measurement of the alignment microscope, it is not necessary to conduct a complicated work of removing the substrate rotating the substrate and then to re-mount the substrate on the holder. In this case, since the rotation of the substrata is conducted, while the substrate is held on the holder, a central positional deviation of the substrate before and after the rotation will not occur. Accordingly, the TIS measurement of the alignment microscope can be executed accurately in a short time.
申请公布号 JP2002050560(A) 申请公布日期 2002.02.15
申请号 JP20000234746 申请日期 2000.08.02
申请人 NIKON CORP 发明人 TAKAHASHI AKIRA
分类号 G01B11/00;G03F7/20;G03F9/00;G12B5/00;H01L21/027;(IPC1-7):H01L21/027 主分类号 G01B11/00
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