| 发明名称 |
Positive photosensitive composition and method for producing a precision integrated circuit element using the same |
| 摘要 |
<p>A positive photosensitive composition comprises: (A) a compound generating an acid upon irradiation with one of an actinic ray and radiation; (B) a resin containing a monocyclic or polycyclic alicyclic hydrocarbon structure and increasing the solubility to an alkali developer by the action of an acid; and (C) an onium salt of carboxylic acid.</p> |
| 申请公布号 |
EP1179750(A1) |
申请公布日期 |
2002.02.13 |
| 申请号 |
EP20010117796 |
申请日期 |
2001.08.02 |
| 申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
KODAMA, KUNIHIKO;AOAI, TOSHIAKI |
| 分类号 |
G03F7/004;G03F7/039;(IPC1-7):G03F7/039 |
主分类号 |
G03F7/004 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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