| 摘要 |
PROBLEM TO BE SOLVED: To provide a safe substrate cleaning apparatus which can supply sufficiently the clean air owing to down-flow even when cleaning by chemicals and spin-drying are conducted within a tank, prevent diffusion of atmosphere of chemicals and re-deposition of mist during the drying process in an adequate closed construction, and also maintain the closed construction for a certain period even if an exhaust system is failed and thereby prevent diffusion of the chemicals. SOLUTION: The substrate cleaning apparatus is provided with a suction port 12 at an upper part of a cleaning tank 11, and a exhaust port 17 at the bottom portion to form down-flow within the cleaning tank 11. The apparatus rotates a substrate Wf to be cleaned within the cleaning tank 11 to realize cleaning and drying processes of the substrate to be cleaned within the same cleaning tank 11. Moreover, a door 14 is also provided to close and open the suction port 12. When the pressure in the cleaning tank 11 is defined as PIN, while an outside pressure of the cleaning tank is defined as POUT, the suction port 12 is opened for the condition of PIN<POUT and the suction port 12 is closed for the condition of PIN>=POUT.
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