发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 <p>PROBLEM TO BE SOLVED: To stably maintain the processing quality and efficiency through appropriate management of intensity of the ultraviolet-ray for a substrate to be processed in the ultraviolet-ray irradiation process. SOLUTION: An output signal (for example, a photo-current) of a photo-sensor 104 on a stage 94 is inputted to an illuminance measuring circuit 128. The illuminance measuring circuit 128 obtains a measuring value E of the intensity of the ultraviolet-ray at the surface of a substrate G on the stage 94 using a value of the output signal of the photo-sensor 104, and an offset value (d) of the height position between the photo-sensing surface of the photo-sensor 104 and the surface of the substrate G as the parameters. An illuminance comparator 132 compares the measured value E of the ultraviolet-ray intensity with the reference standard Es from a reference illuminance setting means 134 to obtain a difference, namely an errorδE of illuminance. A stage lifting control means 136 drives and controls a stage lifting drive mean 116 so as to approximate such errorδE to zero in order to change the substrate supporting height Ha of the stage 94. As a result, variable adjustment of height of the stage is stopped when the ultraviolet-ray illuminance measuring value E obtained from the illuminance measuring circuit 128 matches the reference standard Es.</p>
申请公布号 JP2002043268(A) 申请公布日期 2002.02.08
申请号 JP20000223690 申请日期 2000.07.25
申请人 TOKYO ELECTRON LTD 发明人 UCHIHIRA NORIO
分类号 H01L21/683;H01L21/027;H01L21/304;H01L21/68;(IPC1-7):H01L21/304 主分类号 H01L21/683
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