| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and a device for depositing a sputter film, which can improve an availability factor. SOLUTION: The method comprises cleaning the surface of the target 16 by means of expanding the magnetic field along the face of the target 16 wider than the field in depositing the sputter film on a glass substrate, after forming a film with constituent of a target 16 on a predetermined number of glass substrates by sputtering using a magnetic field. Thus, the surface of the target 16 on which particles stick, including uneroded region 22 can be cleaned without opening to air, which results in the improvement of the availability factor.
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