发明名称 |
Electrostatic discharge protecting circuit for semiconductor device |
摘要 |
An electrostatic discharge protecting circuit for a semiconductor device is provided and includes a first circuit portion including an N-type MOS field effect transistor formed on a P-type silicon substrate and a P-type MOS field effect transistor formed on an N-type well in the P-type silicon substrate. The electrostatic discharge protecting circuit operates in a normal operating mode and an electrostatic discharge evaluation mode. In the normal operating mode, the N- and P-type MOS transistors operate as an output buffer connected to an internal circuit. In the electrostatic discharge characteristic mode, an electrostatic discharge signal is applied from an external source through a pad and switching devices included in a second portion of the electrostatic discharge protecting circuit connect a bulk terminal of the N-type MOS transistor to a ground voltage, thereby improving electrostatic discharge characteristics of the semiconductor device.
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申请公布号 |
US6344960(B1) |
申请公布日期 |
2002.02.05 |
申请号 |
US19990457890 |
申请日期 |
1999.12.10 |
申请人 |
HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. |
发明人 |
SEO DONG-HYUN;PARK HONG-BAE |
分类号 |
H01L27/02;(IPC1-7):H02H3/22 |
主分类号 |
H01L27/02 |
代理机构 |
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