| 发明名称 |
CERAMIC SUBSTRATE FOR SEMICONDUCTOR MANUFACTURE/INSPECTION APPARATUS, CERAMIC HEATER, ELECTROSTATIC CLAMPLESS HOLDER, AND SUBSTRATE FOR WAFER PROBER |
| 摘要 |
A ceramic substrate for semiconductor manufacture/inspection apparatus which radiates little a radiation, has a heat conductivity hardly varying with time, and is excellent in temperature controllability is characterized in that the a radiation emitted from the ceramic substrate is over 0.25 c/cm<2> . hr and below 50 c/cm<2> . hr.
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| 申请公布号 |
WO0209171(A1) |
申请公布日期 |
2002.01.31 |
| 申请号 |
WO2001JP06395 |
申请日期 |
2001.07.25 |
| 申请人 |
IBIDEN CO., LTD.;ITO, YASUTAKA;HIRAMATSU, YASUJI |
发明人 |
ITO, YASUTAKA;HIRAMATSU, YASUJI |
| 分类号 |
H01L21/00;H01L21/683;H05B3/14;(IPC1-7):H01L21/68;C04B35/10;H05B3/10;H05B3/20 |
主分类号 |
H01L21/00 |
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