发明名称 |
High repetition rate gas discharge laser with precise pulse timing control |
摘要 |
A high repetition rate, compact, modular gas discharge, ultraviolet laser. The laser is useful as a light source for very rapid inspections of wafers in an integrated circuit fabrication process. It is also useful for reticle writing at very rapid rates. A preferred embodiment operates at pulse repetition rates of 1000 to 4000 Hz and is designed for round-the-clock production line operation. This preferred embodiment comprises a pulse control unit which controls the timing of pulses to an accuracy of less than 4 nanoseconds. Preferred embodiments of this gas discharge laser can be configured to operate with a KrF gas mixture, an ArF gas mixture or an F2 gas mixture, each with an approximate buffer gas, producing 248 nm, 197 nm or 157 nm ultraviolet light pulses.
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申请公布号 |
US2002012376(A1) |
申请公布日期 |
2002.01.31 |
申请号 |
US20010837035 |
申请日期 |
2001.04.18 |
申请人 |
DAS PALASH P.;YU JENNAN;ANDERSON STUART L.;SCHILLINGER HELMUT;PFLANZ TOBIAS;STROWITZKI CLAUS;HARTMANN CLAUDIA A.;GEIGER STEPHAN;SMITH BRETT D.;PARTLO WILLIAM N. |
发明人 |
DAS PALASH P.;YU JENNAN;ANDERSON STUART L.;SCHILLINGER HELMUT;PFLANZ TOBIAS;STROWITZKI CLAUS;HARTMANN CLAUDIA A.;GEIGER STEPHAN;SMITH BRETT D.;PARTLO WILLIAM N. |
分类号 |
G03F7/20;H01S3/036;H01S3/038;H01S3/04;H01S3/041;H01S3/097;H01S3/0971;H01S3/0975;H01S3/104;H01S3/105;H01S3/1055;H01S3/11;H01S3/134;H01S3/22;H01S3/225;H03K3/57;H03K17/80;(IPC1-7):H01S3/22;H01S3/223 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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