| 摘要 |
PROBLEM TO BE SOLVED: To peel a photoresist film in a short time. SOLUTION: Ozone water manufacturing equipment for peeling a photoresist film consists of an ozone generating device 1 for generating ozone, whose concentration is almost 230 g/Nm3, an ozone concentration increasing device 2 for increasing concentration of the generated ozone up to almost 800 g/Nm3, a pure water supplying system 3, a heater 4 which is arranged in the system and heats ozone water up to about 45 deg.C, an ozone-dissolving module 5 which dissolves ozone in superpure water with a high concentration of about 50 ppm, etc. For example, peeling treatment is enabled in a short time within 10 minutes, even when a photoresist film has hard to peel property and which has been exposed to an environment of phosphorus ion implantation. |
