发明名称 QUANTITATIVE ANALYSIS METHOD FOR TRACE SULFUR COMPONENT IN ELECTROLESS PLATING SOLUTION AND ELECTROLESS PLATING METHOD USING THE METHOD
摘要 PROBLEM TO BE SOLVED: To provide an analysis method by which a sulfur component contained in an electroless plating solution can quantitatively be analyzed with high reproducibility even in the case of being a trace amount of several to several tens ppm and to provide an electroless plating method using the above method. SOLUTION: In this analysis method, one or more metallic compounds selected from gallium, indium, antimony and bismuth compounds are added to an electroless plating solution containing a trace amount of sulfur component to prepare an insoluble salt, and a trace amount of sulfur component is quantitatively analyzed by the transmittance of a suspension, and the electroless plating method uses the above method.
申请公布号 JP2002030450(A) 申请公布日期 2002.01.31
申请号 JP20000216766 申请日期 2000.07.18
申请人 HITACHI CHEM CO LTD 发明人 YAMAMOTO HIROSHI;YAMASHITA TOMOAKI
分类号 G01N31/00;C23C18/16;G01N21/82;(IPC1-7):C23C18/16 主分类号 G01N31/00
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