LIGHTING SYSTEM FOR CHARGED PARTICLE LITHOGRAPHY DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method and device for controlling beam radiation by providing a quadrupole lens array in a drift space of a lighting system component. SOLUTION: The lighting system component is an electron gun, a liner tube fitted to the electron gun, or a drift tube while the quadrupole lens array is three or more mesh grids or combination of the grid and a continuous foil. The quadrupole lens array forms multiple micro lenses similar to an optical 'fly's eye' lens. The quadrupole lens array splits the incident solid electron beam into multiple sub-beam, allowing out-going beam radiation to be different from incident beam radiation while total current of beam does not change. The method and device allow individual control of beam current and beam radiation.