发明名称 III-V SEMICONDUCTOR MULTILAYER FILM AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device, in particular, a semiconductor laser, of excellent characteristics, by satisfactorily growing an Al-rich semiconductor layer on a P-containing layer. SOLUTION: In a III-V semiconductor multilayer film, a layer 11 having thickness of 1 nm or thicker and not containing P and Al is sandwiched between a layer 10 having a content of P of group-V of 20% or more and a layer 12 having an Al content of 20% or more. By adopting this structure, resistance increase in the Al-containing layer can be prevented by suppressing incorporation of Si impurities which compensate p-type dopants of Zn in the Al-containing layer.
申请公布号 JP2002026457(A) 申请公布日期 2002.01.25
申请号 JP20000203534 申请日期 2000.07.05
申请人 NIPPON TELEGR & TELEPH CORP <NTT> 发明人 TATENO KOUTA;AMANO CHIKARA
分类号 C01G28/00;C01B25/08;C23C16/30;H01L21/205;H01L33/06;H01L33/12;H01L33/30;H01S5/323 主分类号 C01G28/00
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