| 摘要 |
PROBLEM TO BE SOLVED: To improve cleanliness level of the entire carrying route from a coater developer or the like for performing the pre- and post-processings of a water to processing chamber, such as a vacuum alignment chamber. SOLUTION: Between the processing chamber 3 which holds a mask M and the wafer W and the coater developer 8, a load lock chamber 5 and a carrying mechanism 9 are provided. Since it is difficult to manage the cleanliness, level of the wafer, when the carrying mechanism 9 is exposed to the atmosphere, a clean booth 14 for covering the carrying mechanism 9 is provided and the laminar flow of clean air is generated in it. |
