发明名称 SUBSTRATE-TREATING APPARATUS AND TREATED SUBSTRATE OBTAINED BY IT
摘要 PROBLEM TO BE SOLVED: To provide a substrate-treating apparatus such as etching for manufacturing a printed wiring board or the like for coping with the increase in the number of functions and density, thin-line, and thinning by a plastic film, a glass fiber film, metal foil, or a sheet-like material such as paper. SOLUTION: A substrate transport path 1 penetrating a tank 2 from a wall surface including a bottom wall surface 18 at the side of a tank upper chamber 2a that is constantly filled with etching liquid and a ceiling wall surface 19 at the side of a lower chamber 2b, and etching liquid is jetted from a plurality of inclined slits 5 and 6 on the upper and lower wall surfaces into the substrate transport path 1 in the direction of the transport of substrates, thus lifting and carrying a substrate 3. Since the substrate 3 is carried in the flow of liquid, no wrinkles and hit mark are generated on the surface of the substrate 3 even if the substrate 3 is in a thin-film shape. Also, especially since the fine conductor circuit pattern of the printed-wiring board does not touch a device member, the circuit pattern cannot be damaged. Further, treatment by the etching liquid on the substrate surface can be made uniformly, the entire substrate surface can be treated uniformly.
申请公布号 JP2002026490(A) 申请公布日期 2002.01.25
申请号 JP20000205760 申请日期 2000.07.06
申请人 SHIIZU:KK 发明人 INOUE KAZUHISA
分类号 B65G49/02;C23F1/08;H05K3/06;(IPC1-7):H05K3/06 主分类号 B65G49/02
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