| 摘要 |
<p>A segmented electrode apparatus (50) for use in plasma processing in a plasma chamber (20) or as part of a plasma processing system (12). The apparatus is composed of a plurality of electrode segments (52) each having an upper surface (52U), a lower surface (52L) and a periphery (52P). the lower surfaces of the electrode segments define an electrode segment plane (P). Further included in the electrode is a plurality of displaceable insulating ring assemblies (56) with a conductive shielding layer in each of the them. Each assembly has an insulating body (128) with an upper and lower portion (130U, 130L) and surrounds a corresponding one of the electrode segments at the electrode segment periphery. Each insulating ring assembly is arranged adjacent another insulating ring assembly and is displaceable with respect thereto and to the corresponding electrode segment. Also included in the electrode apparatus is a plurality of displacement actuators (170) connected to the chamber and to the plurality of insulating ring assemblies at the insulating body upper portions. The displacement actuators are used to displace at least one of the insulating ring assemblies relative to the corresponding one of the electrode segments so as to cause the lower portion of at least one insulating body to move in a direction perpendicular to the electrode segment plane.</p> |
