发明名称 VACUUM ARC EVAPORATION SOURCE, AND FILM DEPOSITION SYSTEM USING IT
摘要 PROBLEM TO BE SOLVED: To provide a vacuum arc evaporation source, with which a laminated film consisting of a plurality of dissimilar films can be deposited by using evaporation sources smaller in number than those heretofore in use. SOLUTION: This vacuum arc evaporation source 30 is used for the purpose of evaporating cathodes by vacuum arc discharge to produce plasma 36, 38 containing cathode materials and has two mutually electrically insulated cathodes 32, 34 composed of materials different in kind from each other. Both the cathodes 32, 34 are arranged coaxially with each other, having an insulator 40 interposed between them. By using this vacuum arc evaporation source 30, the two cathodes 32, 34 can be used while being switched. Resultantly, the laminated film consisting of a plurality of dissimilar films can be deposited by using the evaporation sources smaller in number than those heretofore in use.
申请公布号 JP2002020860(A) 申请公布日期 2002.01.23
申请号 JP20000204961 申请日期 2000.07.06
申请人 NISSIN ELECTRIC CO LTD 发明人 MURAKAMI HIROSHI
分类号 C23C14/24;C23C14/32;H01J37/32;H01J37/34;(IPC1-7):C23C14/32 主分类号 C23C14/24
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