发明名称 |
METHOD FOR FILM FORMING, METHOD FOR MANUFACTURING SUBSTRATE FOR LIQUID CRYSTAL, SUBSTRATE FOR LIQUID CRYSTAL MANUFACTURED THEREBY, LIQUID CRYSTAL DEVICE AND ELECTRONIC INSTRUMENT USING THE SAME AND FILM FORMING DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for film forming a film with uniform film thickness in a substrate surface, a method for manufacturing a substrate for a liquid crystal, the substrate for the liquid crystal manufactured thereby, a liquid crystal device and an electronic instrument using the same and a film forming device. SOLUTION: A coated film is formed on a substrate 340 by supplying an alignment layer material from a nozzle 320 for the alignment layer material while rotating the substrate 340 and subsequently the coated film is dried by supplying gas from a gas nozzle 310 to the coated film while rotating the substrate 340. |
申请公布号 |
JP2002023165(A) |
申请公布日期 |
2002.01.23 |
申请号 |
JP20000207075 |
申请日期 |
2000.07.07 |
申请人 |
SEIKO EPSON CORP |
发明人 |
YAZAKI MASAYUKI |
分类号 |
G02F1/13;B05C5/00;B05C9/12;B05C11/08;B05D1/40;B05D7/00;G02F1/1333;G02F1/1337;(IPC1-7):G02F1/133;G02F1/133 |
主分类号 |
G02F1/13 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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