发明名称 METHOD FOR FILM FORMING, METHOD FOR MANUFACTURING SUBSTRATE FOR LIQUID CRYSTAL, SUBSTRATE FOR LIQUID CRYSTAL MANUFACTURED THEREBY, LIQUID CRYSTAL DEVICE AND ELECTRONIC INSTRUMENT USING THE SAME AND FILM FORMING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method for film forming a film with uniform film thickness in a substrate surface, a method for manufacturing a substrate for a liquid crystal, the substrate for the liquid crystal manufactured thereby, a liquid crystal device and an electronic instrument using the same and a film forming device. SOLUTION: A coated film is formed on a substrate 340 by supplying an alignment layer material from a nozzle 320 for the alignment layer material while rotating the substrate 340 and subsequently the coated film is dried by supplying gas from a gas nozzle 310 to the coated film while rotating the substrate 340.
申请公布号 JP2002023165(A) 申请公布日期 2002.01.23
申请号 JP20000207075 申请日期 2000.07.07
申请人 SEIKO EPSON CORP 发明人 YAZAKI MASAYUKI
分类号 G02F1/13;B05C5/00;B05C9/12;B05C11/08;B05D1/40;B05D7/00;G02F1/1333;G02F1/1337;(IPC1-7):G02F1/133;G02F1/133 主分类号 G02F1/13
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