发明名称 LOW MELTING POINT GLASS PASTE FOR FORMATION OF DIELECTRIC LAYER AND LOW MELTING POINT GLASS
摘要 PROBLEM TO BE SOLVED: To prevent decrease in the conductivity of a transparent electrode due to the high temperature process of forming a dielectric layer which covers the electrode. SOLUTION: The low melting point glass paste is to be used to form a dielectric layer on a transparent electrode pattern formed on a plasma display substrate and the paste is prepared by incorporating oxides as the main component of the transparent electrode by 0.1 to 10 wt.% into PbO-SiO2-B2O5-ZnO or PbO- SiO2-B2O3-ZnO-BaO glass. Specifically, when the transparent electrode is ITO essentially comprising indium oxide, the low melting point glass paste contains indium oxide. By incorporating the main component of the transparent electrode, the conductivity of the transparent electrode is not lost even in the succeeding high temperature process.
申请公布号 JP2002020138(A) 申请公布日期 2002.01.23
申请号 JP20010134960 申请日期 2001.05.02
申请人 FUJITSU LTD;CENTRAL GLASS CO LTD 发明人 AWAJI NORIYUKI;BETSUI KEIICHI;TADAKI SHINJI
分类号 C03C8/14;C03C8/10;G09F9/30;G09F9/313;H01J11/22;H01J11/34;H01J11/38;(IPC1-7):C03C8/14;H01J11/02 主分类号 C03C8/14
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