| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus preventing the lowering of exhaustion characteristics at the time of vacuum suction caused by particles adhering to the inner surface of a chamber and capable of shortening a tact time. SOLUTION: A lining plate 15 is applied to the inner surface of the chamber 1. The lining plate 15 has a smooth surface to which no roughening processing is applied. Plasma is generated in the chamber 1 and the surface of a printed circuit board 13 is etched by plasma to be cleaned. Particles generated by etching scatters to the circumference to adhere to the lining plate 15 but, since the lining plate 15 has the smooth surface, particles are hard to adhere and moisture is also hard to adhere. Accordingly, the lowering of exhaustion characteristics at the time of vacuum suction caused by particles is prevented and the tact time can be shortened. |
