发明名称 NOTCH GRINDING DEVICE OF SEMICONDUCTOR WAFER, AND SEMICONDUCTOR WAFER
摘要 PROBLEM TO BE SOLVED: To provide a notch grinding device that prevents a streak from easily breaking a semiconductor wafer in the crystal direction in chamfering the wafer, and the semiconductor wafer having a notch groove hardly developing a crack. SOLUTION: This notch grinding device comprises a disk-like grinding wheel 5 rotatably supported on a grinding wheel block 40, a work support block 57 for holding the semiconductor wafer 1 in a face obliquely crossing the plate surface of the grinding wheel 5, an Y-axis feed mechanism 20 for relatively moving the grinding wheel 5 in the Y-axis direction for allowing the grinding wheel 5 to approach to or separate from the wafer 1 on a plane parallel with the plate surface of the wafer 1, the X-axis feed mechanism 30 for relatively moving the grinding wheel 5 in the X-axis direction crossing Y-axis direction on the plane parallel with the plate surface of the wafer 1, and a lifting mechanism 50 for relatively moving the grinding wheel 5 in the Z-axis direction crossing the plate surface of the wafer 1. The grinding wheel 5 and the wafer 1 are relatively moved in three directions, and the notch groove 3 in the wafer 1 is chamfered.
申请公布号 JP2002018684(A) 申请公布日期 2002.01.22
申请号 JP20000211093 申请日期 2000.07.12
申请人 NIPPEI TOYAMA CORP 发明人 MURAI SHIRO;KAGA MUNEAKI;OKUYAMA TETSUO;TAKADA MICHIHIRO;WADA TOYOHISA
分类号 B24B9/00;H01L21/02;H01L21/304;(IPC1-7):B24B9/00 主分类号 B24B9/00
代理机构 代理人
主权项
地址
您可能感兴趣的专利