| 摘要 |
PROBLEM TO BE SOLVED: To provide an aligner, capable of avoiding the effects of abnormal state of surface of a substrate and suppressing transfer of a defocused pattern image. SOLUTION: A position on a wafer surface is detected by a light sensor of a light-receiving device beforehand, to obtain an alignment plane APF, based on the detected result. The surface of the wafer is aligned to the alignment plane APF, to detect the position on the wafer surface again by a part of the light sensor in this state. Abnormality is checked at the position of each detection point AFij in the detected result to specify the abnormal detection point AFij', when the abnormal detection point AFij' for showing abnormal value is included. A new alignment plane is obtained, based on the detection result by a light sensor at another detection point AFij different from the abnormal detection point AFij', to align the surface of the wafer to the new alignment plane.
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