发明名称 PRODUCING METHOD FOR OPTICAL ELEMENT, OPTICAL ELEMENT, OPTICAL SYSTEM USING OPTICAL ELEMENT, PRODUCING METHOD FOR DEVICE AND DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method for producing an optical element which can stably maintain its designed optical performance for a long time without reduction in transmittance due to deterioration of the surface of quartz, without generation of deterioration of quartz due to irradiation of laser beams over a long time, without a change in the optical characteristics as an optical element, and to provide the optical element, an optical system using the optical element, an optical apparatus, and a method for producing a device and the device. SOLUTION: This method for producing the optical element is a method which includes a stage for processing high purity synthetic quartz glass by means of lithography, or a method wherein the above glass is subjected to a hydrogen containing treatment after being processed.
申请公布号 JP2002003227(A) 申请公布日期 2002.01.09
申请号 JP20000181217 申请日期 2000.06.16
申请人 CANON INC 发明人 CHIBA KEIKO
分类号 C03B20/00;C03C3/06;C03C15/00;G02B1/00;G02B3/00;G02B5/18;G03F7/20;H01L21/027;(IPC1-7):C03B20/00 主分类号 C03B20/00
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