| 摘要 |
PROBLEM TO BE SOLVED: To provide a radiation sensitive resist composition having high resolution, ensuring improved edge roughness of a resist pattern and excellent in aging stability. SOLUTION: The radiation sensitive resist composition contains a silicon (Si)-containing resin having a velocity of dissolution in an alkali developing solution increased by the action of an acid, a photo-acid generating agent, a solvent and a basic compound having >=5 repeating units with a specified structure as an average number (n) of repeating units. |
