发明名称 Film or coating deposition on a substrate
摘要 A method of depositing a material onto a substrate, comprising the steps of: feeding a material solution to an outlet to provide a stream of droplets of the material solution; applying a potential difference between the outlet and a substrate to electrostatically attract the droplets from the outlet towards the substrate such that a corona discharge is formed around the outlet; heating the substrate to provide an increase in temperature between the outlet and the substrate; and progressively increasing the temperature of the substrate during material deposition.
申请公布号 US2001054379(A1) 申请公布日期 2001.12.27
申请号 US20010912859 申请日期 2001.07.25
申请人 CHOY KWANG-LEONG;BAI WAI 发明人 CHOY KWANG-LEONG;BAI WAI
分类号 C23C26/00;B05B5/08;B05D1/04;C23C4/12;C23C16/448;(IPC1-7):B05D3/02;B05D1/40 主分类号 C23C26/00
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