| 摘要 |
A plasma dry scrubber for scrubbing gas comprises a plasma generator, an impedance matching unit, and an RF generator. A high frequency signal generated by the RF generator is fed, via the impedance matching unit, to first and second antennas, which are provided at the upper and lower parts, respectively, of the plasma generator. Gas flowing into the plasma generator is decomposed by means of magnetic fields generated by the first and second antennas, and the decomposed gas is discharged to a vacuum pump via a gas outlet pipe. The magnetic fields generated by first and second antennas are distributed more uniformly in a plasma generating chamber so that plasma discharge is accomplished uniformly. Furthermore, the non-conductive isolating plates are made of ceramic or quartz so as to isolate the first and second antennas, respectively, from the plasma generating chamber. The thickness of the isolating plates may be altered, if required, whereby any damage to the plasma dry scrubber, due to the pressure from a vacuum pump, is prevented, even if it is used for a long time.
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