发明名称 |
CONFIGURABLE SINGLE SUBSTRATE WET-DRY INTEGRATED CLUSTER CLEANER |
摘要 |
The present invention provides a method and an apparatus for cleaning substrates. The cleaning chamber defines a processing cavity adapted to accommodate a substrate therein. In one embodiment, the cleaning chamber includes an upper plate, a lower plate and a gas manifold disposed there between. A substrate is disposed in the processing cavity without contacting other chamber components by a Bernoulli effect and/or by a fluid cushion above and/or below the substrate. Fluid is flowed into the processing cavity at an angle relative to a radial line of the substrate to induce rotation of the substrate during a cleaning and drying process. A cleaning process involves flowing one or more fluids onto a surface of the substrate during its rotation. One-sided and two-sided cleaning and drying is provided.
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申请公布号 |
WO0199156(A1) |
申请公布日期 |
2001.12.27 |
申请号 |
WO2001US19121 |
申请日期 |
2001.06.15 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
LUSCHER, PAUL, E.;CARDUCCI, JAMES, D.;SALIMIAN, SIAMAK |
分类号 |
H01L21/304;B08B3/04;H01L21/00;(IPC1-7):H01L21/00;H01L21/306 |
主分类号 |
H01L21/304 |
代理机构 |
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地址 |
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