发明名称 X-RAY OPTICAL DEVICE FOR SMALL ANGLE SCATTERING MEASUREMENT AND MULTILAYER FILM MIRROR
摘要 PROBLEM TO BE SOLVED: To realize highly accurate small angle scattering measurement by optimizing both small angle resolution and incident X-ray intensity relative to a sample. SOLUTION: A multilayer film 1 having an elliptic reflection surface and a spread angleδof an X-ray is provided. The elliptic reflection surface of the multilayer film 1 has two focuses. When an X-ray source 2 is arranged on one focus A and the X-rays diverging from the X-ray source 2 are reflected by the multilayer film 1, the reflected X-rays are focused on the other focus B. The X-ray source 2 is arranged on one focus A of the multilayer film 1, and the distance L2 from the center position on the reflection surface of the multilayer film 1 to the other focus B (namely, a convergent point of the reflected X-rays) is set so that a convergent angleθc of the X-rays at the focus B becomes roughly twice as large as the spread angleδ. By this formation, both the small angle resolution and the incident X-ray intensity relative to the sample are optimized, to thereby realize the highly accurate small angle scattering measurement.
申请公布号 JP2001356197(A) 申请公布日期 2001.12.26
申请号 JP20010109081 申请日期 2001.04.06
申请人 RIGAKU CORP 发明人 IWASAKI YOSHIO
分类号 G01N23/201;G02B17/08;G21K1/06;(IPC1-7):G21K1/06 主分类号 G01N23/201
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