METHOD FOR ELECTRON BEAM LITHOGRAPHY

摘要

PROBLEM TO BE SOLVED: To improve precision in overwriting by eliminating deteriorated dimensional precision by the shifted positional error considered to be caused by the blurred electron beam in a overwriting method for improving a connecting accuracy in a batch graphic illuminating method. SOLUTION: A method for the electron beam lithography comprises the steps of cutting out a different batch graphic form from a pattern, deviating fulcra of a plurality of batch graphic forms, and overwriting.