发明名称 METHOD FOR DEPOSITING ELECTROLESS PLATING FILM
摘要 PROBLEM TO BE SOLVED: To provide a method for depositing an electroless plating film by which the deposition process of an electroless plating film is simplified, and also, the danger, e.g. of treating virulent poison is not accompanied at the time of the deposition. SOLUTION: After mixed hydroxide colloids 31 having a plurality of metallic hydroxides are adhered to a prescribed member 30, an electroless plating solution is fed to the above member.
申请公布号 JP2001355075(A) 申请公布日期 2001.12.25
申请号 JP20010125698 申请日期 2001.04.24
申请人 MITSUBISHI ELECTRIC CORP 发明人 FUJINO JUNJI;MURAKAMI KOHEI;HAYASHI OSAMU;HOSHINOUCHI SUSUMU;KAWASHIMA YASUO
分类号 C23C18/18;H01L23/36;H01L23/50;(IPC1-7):C23C18/18 主分类号 C23C18/18
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