| 摘要 |
PROBLEM TO BE SOLVED: To provide a fluorine-containing photoresist composition developable with an aqueous alkali solution, capable of adopting a short-wavelength light source and capable of retaining flatness, dry etching resistance, heat resistance, etc. SOLUTION: The resist composition contains a fluoropolymer (X) containing a monomeric unit of a fluorine-containing vinyl monomer (a) having a blocked acidic group and a monomeric unit of an alicyclic vinyl monomer (b), an acid generating compound (Y) which generates an acid when irradiated with light and an organic solvent (Z). |
