| 摘要 |
PROBLEM TO BE SOLVED: To reduce the size and cost of a production equipment as well as to form all layers of an aluminum reflecting mirror using a resistance heating vapor deposition method, by successively forming an SiO film, an Al film, an MgF2 film, a CeO2 film and an SiO2 film by vapor deposition on a glass substrate. SOLUTION: A chamber is evacuated, SiO is vapor-deposited on a glass substrate to form a protective film as a first layer, Al is vapor-deposited on a the first layer to form an aluminum reflecting film as a second layer, MgF2 is vapor-deposited on the second layer to form a transparent protective film as a third layer and CeO2 is vapor-deposited on the third layer to form a transparent protective film as a fourth layer. Gaseous O2 is then introduced into the chamber and SiO2 is vapor-deposited on the fourth layer, to form a transparent protective film as a fifth layer.
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