SUBSTRATE-PROCESSING DEVICE

摘要

PROBLEM TO BE SOLVED: To enable a single substrate-processing device to deal with a thin film to a thick film. SOLUTION: An oxidizing device has a structure in which steam is introduced into a reaction chamber 1 from a steam generator outside the reaction chamber 1, and a substrate disposed in the reaction chamber 1 is subjected to an oxidization treatment process. An external combustion equipment 11 serving as a first steam generating device for generating steam, by burning hydrogen gas and oxygen gas and a water-generating equipment 12 serving as a second steam- generating device for generating water vapor by the use of hydrogen gas and oxygen gas without burning them are provided as the steam generator. A gas feed system 15 is used in common to feed hydrogen gas and oxygen gas to both the external combustion equipment 11 and water generating equipment 12 in common.