| 发明名称 |
SEMICONDUCTOR DEVICE AND FABRICATING METHOD THEREOF |
| 摘要 |
The present invention presents methods for, inter alia, cleaning and etching semiconductor wafers with a solution containing ammonium fluoride and control of the process used for preparing such a solution at its point of use. |
| 申请公布号 |
KR20010112709(A) |
申请公布日期 |
2001.12.21 |
| 申请号 |
KR20000032090 |
申请日期 |
2000.06.12 |
| 申请人 |
KEC CORP. |
发明人 |
EOM, SUN YEONG;HONG, GI SEOK;JANG, DONG GEUN |
| 分类号 |
H01L29/772 |
主分类号 |
H01L29/772 |
| 代理机构 |
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| 主权项 |
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