| 发明名称 |
Photolithographic system for semiconductor wafers corrects diffraction errors by phase filter in Fourier plane suits small structures |
| 摘要 |
A photolithographic system has a phase correcting filter (308) in the Fourier transform plane between two lenses (306,310) so that the image of the mask (304) projected on the semiconductor wafer (312) is corrected for diffraction effects.
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| 申请公布号 |
DE10027984(A1) |
申请公布日期 |
2001.12.20 |
| 申请号 |
DE20001027984 |
申请日期 |
2000.06.06 |
| 申请人 |
PROMOS TECHNOLOGIES, INC.;MOSEL VITELIC INC., HSIN CHU;INFINEON TECHNOLOGIES AG |
发明人 |
YEH, CHIN-THE;TENG, WALTER |
| 分类号 |
G03F7/20;(IPC1-7):G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
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