发明名称 |
Processing system and method |
摘要 |
<p>A processing system is provided that includes a processing chamber, and a source of gas coupled to the processing chamber for supplying a gas thereto. A pump is located adjacent the processing chamber, and is coupled to the processing chamber for pumping the gas from the processing chamber. The processing system further includes a recycling line, coupled to the pump and adapted to cycle at least a portion of the gas pumped from the processing chamber back into the processing chamber. Methods for cleaning deposition chambers and for etching semiconductor substrates are also provided. <IMAGE></p> |
申请公布号 |
EP1164628(A2) |
申请公布日期 |
2001.12.19 |
申请号 |
EP20010112910 |
申请日期 |
2001.06.05 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
RAOUX, SEBASTIEN;TANAKA, TSUTOMU (TOM);NOWAK, THOMAS |
分类号 |
B01J19/08;B08B7/00;C23C16/44;C23C16/452;C23C16/455;C23F4/00;H01J37/32;H01L21/205;H01L21/302;H01L21/3065;(IPC1-7):H01J37/32 |
主分类号 |
B01J19/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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