COMPOSITION FOR ELECTRON REFLECTION LAYER AND SHADOW MASK USING THE SAME,申请号KR1019940033111-传众专利搜索

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发明名称	COMPOSITION FOR ELECTRON REFLECTION LAYER AND SHADOW MASK USING THE SAME
摘要
申请公布号	KR100319082(B1)	申请公布日期	2001.12.15
申请号	KR1019940033111	申请日期	1994.12.07
申请人		发明人
分类号		主分类号
代理机构		代理人
主权项
地址

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