发明名称 SUPPORTING STRUCTURE FOR OPTICAL ELEMENT, EXPOSURE DEVICE USING THE SAME AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide the supporting structure for an optical element capable of reducing the deformation of a lens surface due to a change in a temperature environment, and distortion at the assembling, and which is stable, with less aberration, and capable of attaining high resolution, and to provide an optical device such as an exposure device constituted by introducing the supporting structure, and to provide a method for manufacturing a semiconductor device, etc., by the optical device. SOLUTION: As for the optical element supporting structure of supporting the optical element, the structure is provided with a 1st supporting member for supporting the optical element, and a 2nd supporting member which is positioned on the outer diameter side of the 1st supporting member and for supporting the 1st supporting member, and the 2nd supporting member is provided with an elastic member which is positioned between the 1st supporting member and the 2nd supporting member in a radial direction, and whose inner diameter side is connected with the 1st supporting member and whose outer diameter side is connected with the 2nd supporting member and which is elastically deformed in the radial direction, and the 1st supporting member and the 2nd supporting member are made in a non-contact state in the axial direction.
申请公布号 JP2001343576(A) 申请公布日期 2001.12.14
申请号 JP20010080798 申请日期 2001.03.21
申请人 CANON INC 发明人 EBINUMA RYUICHI;SUDO YUJI
分类号 G02B7/02;G03F7/20;H01L21/027;(IPC1-7):G02B7/02 主分类号 G02B7/02
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