发明名称 Composition for polishing magnetic disk substrate
摘要 An object of the present invention is to provide a composition for polishing a magnetic disk substrate that is used as a storage device for a computer or the like, and is capable of producing a magnetic disk substrate polished with high precision suitable for use in combination with a magnetic head that floats at a low level. Another object of the present invention is to provide a method of producing the composition for polishing the magnetic disk substrate. A polishing composition includes alkali metal ions, abrasive grains, a carboxylic acid, an oxidizing agent, and an anti-gelling agent contained in an aqueous medium. In a method of the present invention for preparing a polishing composition, a pH value of an aqueous medium, in which abrasive grains, a carboxylic acid, an oxidizing agent, and an anti-gelling agent are contained, is adjusted to a range of about 1 to about 5 by the addition of alkali metal hydroxide to the aqueous medium.
申请公布号 US2001049913(A1) 申请公布日期 2001.12.13
申请号 US20010835315 申请日期 2001.04.17
申请人 MIYATA NORIHIKO 发明人 MIYATA NORIHIKO
分类号 B24B37/04;C09C1/68;C09G1/02;G11B5/84;(IPC1-7):C09K3/14;B24D3/02 主分类号 B24B37/04
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