| 摘要 |
An exposure apparatus and exposure method are disclosed, in which a pattern on a first object is illuminated by an illumination system, and the pattern as illuminated is projected by a projection system onto a second object, wherein the same region on the second object to be exposed is exposed plural times through cooperation of the projection and illumination, and wherein the plural times exposures are performed while changing an exposure condition such as illumination condition and/or projection condition.
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