Polarized light irradiation apparatus

摘要

A polarized light irradiation apparatus, having at least two plane mirrors, is constructed to prevent reduction of the extinction ratio of the polarized light that irradiates a substrate when there is a change of the direction of polarization of the polarized light that is incident on a reflecting mirror. This is accomplished by forming a protection layer on the surface of the second plane mirror, and selecting the material and optical thickness of the layer in accordance with the angle of incidence and wavelength of the polarized light so that the difference DELTA of the phase shifts of the polarization P component and the polarization S component emerging from the second plane mirror satisfies the condition that DELTA ≤ +/-20 DEG . By doing this, there will be no reduction of the extinction ratio of the polarized light that irradiates the substrate W if there is a change in the polarization direction of the polarized light that is incident on the second plane mirror. <IMAGE>