发明名称 Method and apparatus for multilayer film deposition utilizing rotating multiple magnetron cathode device
摘要 An apparatus for forming a multilayer film on a substrate surface comprises a multi-target sputtering source having a planar end face adapted for rotation about a central axis and including at least a pair of independently operable planar magnetron cathodes having sputtering targets composed of different materials, and a substrate mounting means for providing a stationary substrate in spaced-apart, facing relation to the sputtering source. According to the inventive method, the multi-target source is rotated about its central axis while the substrate is maintained stationary, thereby depositing a multi-layer film stack on the substrate. The invention finds particular utility in the formation of superlattice structures usable as recording medium layers in the fabrication of magnetic and magneto-optical (MO) data/information storage and retrieval media.
申请公布号 US6328856(B1) 申请公布日期 2001.12.11
申请号 US20000521463 申请日期 2000.03.08
申请人 SEAGATE TECHNOLOGY LLC 发明人 BRUCKER CHARLES FREDERICK
分类号 C23C14/34;C23C14/35;H01J37/34;(IPC1-7):C23C14/06 主分类号 C23C14/34
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