| 摘要 |
An ion implantation apparatus is provided which does not require dummy wafers and which is capable of reducing the manufacturing cost and increasing the throughput. The ion implantation apparatus is provided with holder arms connected to respective wafer holders on the wafer disc, and those holder arms make it possible to move the wafer holders in the radial direction of the wafer disc. The ion implantation apparatus is also provided with a control unit which controls the scanning position such that wafers are irradiated by the ion beam.
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