发明名称 SILICON BOAT AND ITS MANUFACTURING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To provide a silicon boat that inhibits the contamination of a silicon wafer caused by the silicon boat when the wafer is heat-treated, and the occurrence of slippage, and the manufacturing method of the silicon boat. SOLUTION: Face plates 12a and 12b made of silicon, and a post 13 made of the silicon are washed with HF to remove a surface oxide film. After that, the boat parts 12a, 12b, and 13 are combined for assembling the silicon boat. Then, a silicon boat 11 is subjected to hydrogen annealing treatment at a heating temperature of 1100 deg.C or higher for at least one hour. The annealing treatment is made in a hydrogen gas, thus preventing a silicon oxide film from being formed on the surface of the boat parts 12a, 12b, and 13. In addition, annealing treatment is made at a temperature of 1100 deg.C or higher for at least one hour, thus fusing the surface layer of the connection part between the face plates 12a and 12b and post 13, and hence obtaining the silicon boat 11 where the members 12a, 12b, and 13 are integrated.</p>
申请公布号 JP2001338881(A) 申请公布日期 2001.12.07
申请号 JP20000156206 申请日期 2000.05.26
申请人 MITSUBISHI MATERIALS SILICON CORP 发明人 SHIOTA TAKAAKI;NONOGAKI YOSHIHISA;NAKADA YOSHINOBU
分类号 H01L21/302;H01L21/205;H01L21/22;H01L21/306;H01L21/3065;H01L21/68;H01L21/683;(IPC1-7):H01L21/205 主分类号 H01L21/302
代理机构 代理人
主权项
地址