摘要 |
PURPOSE: A photosensitive resin composition is provided to be dissolved in a comparatively safe high-boiling-point solvent, such as propylene glycol, and to be developed with water. CONSTITUTION: A photosensitive resin composition includes a photosensitive saponified PVA having a pendant group derived from a quaternary styrylpyridinium or styrylquinolinium, or a derivative thereof. The composition comprises a photosensitive saponified PVA which has structural units represented by formulas (1) to (4): which product is dissolved in at least one organic solvent selected from the group consisting of compounds represented by formulas (5), (6), and (7).
|