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发明名称
DEVELOPING METHODS FOR PHOTORESIST, APPARATUSES FOR COATING
摘要
<p>Described are process control methods for spin-coating, and apparatuses and devices incorporating the same.</p>
申请公布号
WO2001093313(A2)
申请公布日期
2001.12.06
申请号
US2001016605
申请日期
2001.05.22
申请人
发明人
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主分类号
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