Cleaning method and cleaning apparatus, and electrophotographic photosensitive member and cleaning method of electrophotographic photosensitive member

摘要

The present invention provides a method for efficiently cleaning a cleaning subject, especially a method for cleaning an electrophotographic photosensitive member that enables a uniform and high quality image to be obtained without leaving image defects and irregular images, wherein the cleaning step of the cleaning subject comprises: making the circulation flow rate during dipping of a cleaning subject in the cleaning solution to be different from the circulation flow rate when the cleaning subject is pulled up; and showering the cleaning solution used in the cleaning step during the pull-up step on the surface of the cleaning subject; or wherein the method for manufacturing an electrophotographic photosensitive member for depositing a functional film by a plasma CVD method on an aluminum substrate containing silicon, iron and aluminum especially comprises cleaning steps of: degreasing oil components on the surface of the substrate prior to deposition of a film; making the circulation flow rate during dipping the substrate in the cleaning solvent to be different from the circulation flow rate when the substrate is pulled up; showering the cleaning solution to be used in the degreasing step on the surface of the substrate while the substrate is pulled up; and forming an Al-Si-O coating film using water containing an inhibitor in the rinsing step.