发明名称 Semiconductor photonic device
摘要 A semiconductor photonic device has a Si substrate; a SiO2 film formed on the Si substrate; a ZnO film formed on the SiO2 film; and a semiconductor compound layer represented by InxGayAlzN (x+y+z=1, 0<=x<=1, 0<=y<=1, 0<=z<=1) formed on the ZnO film.
申请公布号 US6326645(B1) 申请公布日期 2001.12.04
申请号 US19990385808 申请日期 1999.08.30
申请人 MURATA MANUFACTURING CO., LTD. 发明人 KADOTA MICHIO
分类号 H01L33/32;H01S5/00;H01S5/32;H01S5/323;(IPC1-7):H01L29/12 主分类号 H01L33/32
代理机构 代理人
主权项
地址
您可能感兴趣的专利